A. Taniike et al., ION-SOURCE AND STRIPPER GAS CELL DEVELOPMENTS FOR THE 6 MEV TANDEM HEAVY-ION BEAM PROBE ON THE LARGE HELICAL DEVICE, IEEE transactions on plasma science, 22(4), 1994, pp. 430-434
The feasibility of a heavy ion beam with a tandem acceleration system
for plasma potential measurement has been examined. A plasma-sputter-t
ype ion source which produces an Au- beam with an energy width as smal
l as 6 eV and a reasonably small emittance of pi mm-mrad (MeV)(1/2), c
an be used for this purpose. Suitable target gas thickness for a charg
e exchange is estimated to be less than 10(15) atom/cm(2) at the 3 MV
terminal voltage.