LASER-INDUCED DECOMPOSITION OF 3-PYRIDINYL(TRIMETHYL)SILANE AND 3-PYRIDINYL(TRIETHOXY)SILANE

Authors
VITEK J URBANOVA M BASTL Z TLASKAL J POLA J ZELDIN M FIFE WK
Citation
J. Vitek et al., LASER-INDUCED DECOMPOSITION OF 3-PYRIDINYL(TRIMETHYL)SILANE AND 3-PYRIDINYL(TRIETHOXY)SILANE, Journal of analytical and applied pyrolysis, 28(2), 1994, pp. 175-182
Citations number
27
Categorie Soggetti
Spectroscopy,"Chemistry Analytical
Journal title
Journal of analytical and applied pyrolysis → ACNP
ISSN journal
01652370
Volume
28
Issue
2
Year of publication
1994
Pages
175 - 182
Database
ISI
SICI code
0165-2370(1994)28:2<175:LDO3A3>2.0.ZU;2-T
Abstract
The gas-phase thermal decomposition of the title compounds, induced by a cw CO2 laser and photosensitized by SF6, leads to the formation of several volatile carbonaceous products (hydrocarbons and ethers) and o ligomeric deposits which contain almost all of the silicon from the pa rent compounds. These materials consist of a low- and a high-molecular weight component and contain only a small part of the nitrogen incorp orated in the pyridinyl group or bonded to oxygen.