Ts. Jung et al., A FULLY INTEGRATED, MONOLITHIC, CRYOGENIC CHARGE SENSITIVE PREAMPLIFIER USING N-CHANNEL JFETS AND POLYSILICON RESISTORS, IEEE transactions on nuclear science, 41(4), 1994, pp. 1240-1245
An N-channel JFET process technology for integrated charge sensitive p
reamplifiers has been developed. The process integrates multiple pinch
-off voltage JFETs fabricated in an n-type epitaxial layer on a low re
sistivity p-type substrate. The process also incorporates polysilicon
resistors integrated on the same die as the JFETs. The optimized polys
ilicon resistors exhibit 1/f noise nearly as good as metal film resist
ors at the same current. Results for the integrated amplifier are disc
ussed.