D. Schaepers et al., ELECTROCHEMICAL, ELLIPSOMETRICAL AND SURFACE ANALYTICAL INVESTIGATIONS OF PASSIVE LAYERS ON BINARY FE AL ALLOYS/, Surface and interface analysis, 21(6-7), 1994, pp. 342-348
X-ray photoelectron spectroscopy, ISS, ellipsometry, electrochemical i
mpedance spectroscopy and electrochemical methods have been used to in
vestigate the passive layers (PAL) on iron/aluminium alloys with low c
ontents of Al (2 up to 12 wt.%). Ellipsometric measurements were perfo
rmed during the galvanostatic reduction of PAL formed on Fe/8Al in 0.5
M Na2SO4/H2SO4 (pH 3.85) at various potentials. Combining the results
of ellipsometric single-layer model evaluations and of the electroche
mical reduction curves it was found that the outer part of the PAL mai
nly consists of the relatively stable gamma-Fe2O3. Its fraction to the
overall thickness of the PAL gives a maximum value when the alloy is
passivated at +1 V(SHE). At higher potentials, porous films with both
decreasing capacities and polarization resistances, measured by impeda
nce spectroscopy, are formed. The XPS and ISS sputter depth profiles o
f PAL on Fe4/12Al formed in phthalate buffer (pH 5) at + 1 V(SHE) show
ed an Al enrichment in the centre of the layers. The reductive dissolu
tion of the passive layer in close combination with XPS analysis at di
stinct states of this process yields similar depth profiles. These res
ults suggest the formation of mixed Fe/Al oxides or oxide compounds.