M. Schmitt et al., YBA2CU3O7 JOSEPHSON-JUNCTIONS AND DC SQUIDS BY MECHANICALLY INDUCED GROWTH DISORDER, Journal of applied physics, 76(5), 1994, pp. 3220-3222
A simple and reproducible method for the fabrication of high-T(c) Jose
phson junctions and SQUIDs is presented. A very weak disturbance is pr
oduced by pressing a diamond needle onto the substrate surface before
film deposition. The junction parameters such as the critical current
I(c), the I(c)R(n) product, or beta = 2I(c)L/PHI0 (with L the self-ind
uctance of the SQUID loop) are accessible by controlling the film thic
kness and can be varied by several orders of magnitude. The junctions
usually have critical current densities j(c) in the range of 5 X 10(4)
1 X 10(5) A/cm2 at 77 K and show Shapiro steps when exposed to rf pow
er. The current-voltage characteristics are resistively shunted juncti
onlike and nonhysteretic. In dc SQUIDs a maximum peak-to-peak voltage
response to dc flux of up to 12 muV at 77 K is observed.