OPTICAL-DAMAGE-RESISTANT IMPURITIES IN LITHIUM-NIOBATE

Citation
T. Volk et al., OPTICAL-DAMAGE-RESISTANT IMPURITIES IN LITHIUM-NIOBATE, Journal of the Optical Society of America. B, Optical physics, 11(9), 1994, pp. 1681-1687
Citations number
38
Categorie Soggetti
Optics
ISSN journal
07403224
Volume
11
Issue
9
Year of publication
1994
Pages
1681 - 1687
Database
ISI
SICI code
0740-3224(1994)11:9<1681:OIIL>2.0.ZU;2-D
Abstract
We analyzed the properties of damage-resistant LiNbO3 crystals doped w ith Mg, Zn, or In. Damage resistance is due to an essential increase i n the photoconductivity sigma(p). In the first two compounds the incre ase in sigma(p) is most pronounced at concentrations exceeding certain threshold (5.5 mol.% MgO or 7 mol. % ZnO in the congruent melt), wher eas in In-doped crystals it occurs at any In concentration. The increa se in sigma(p) is directly related to the reduction of the intrinsic d efects Nb(Li) because of their substitution by damage-resistant impuri ties. If an iron impurity is present, then an abrupt decrease in the c apture cross section of Fe3+ acceptors at Mg or Zn concentrations high er than the threshold is responsible for the observed increase in sigm a(p).