3-DIMENSIONAL ANALYSIS OF LOCALLY DEPOSITED SILICON-OXIDE ON FERRITE BY A COMBINATION OF MICROPROBE RBS AND PIXE

Authors
KINOMURA A HORINO Y MOKUNO Y CHAYAHARA A KIUCHI M FUJII K TAKAI M LU YF
Citation
A. Kinomura et al., 3-DIMENSIONAL ANALYSIS OF LOCALLY DEPOSITED SILICON-OXIDE ON FERRITE BY A COMBINATION OF MICROPROBE RBS AND PIXE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 85(1-4), 1994, pp. 689-692
Citations number
10
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
85
Issue
1-4
Year of publication
1994
Pages
689 - 692
Database
ISI
SICI code
0168-583X(1994)85:1-4<689:3AOLDS>2.0.ZU;2-1
Abstract
Silicon oxide layers locally deposited on ferrite were analyzed by mic roprobe RBS and PIXE with 1.5 MeV protons. Surface distribution of the deposited lines was found to be uniform by an RBS-mapping image in sp ite of a nonuniform image in a secondary-electron measurement. A thick ness of the deposited layer could be nondestructively estimated by a c ombination of RBS and PIXE mapping images.