MEV HEAVY-ION MICROPROBE PIXE FOR THE ANALYSIS OF THE MATERIALS SURFACE

Authors
MOKUNO Y HORINO Y KINOMURA A CHAYAHARA A KIUCHI M FUJII K TAKAI M
Citation
Y. Mokuno et al., MEV HEAVY-ION MICROPROBE PIXE FOR THE ANALYSIS OF THE MATERIALS SURFACE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 85(1-4), 1994, pp. 741-743
Citations number
8
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
85
Issue
1-4
Year of publication
1994
Pages
741 - 743
Database
ISI
SICI code
0168-583X(1994)85:1-4<741:MHMPFT>2.0.ZU;2-2
Abstract
Micro PIXE analysis using MeV phosphorus microprobes was performed to a surface structure which consists of multilevel aluminum wirings in s ilicon nitride and these results were compared with those from a proto n microprobe. In the case of a 2 MeV phosphorus microprobe, the X-ray production was enhanced near the surface due to the large energy depos ition rate or the short projectile range. As a result, the increase in surface sensitivity was clearly shown in PIXE mapping images of alumi num, silicon, and phosphorus.