OBSERVATION OF LOCAL SIMOX LAYERS BY MICROPROBE RBS

Authors
KINOMURA A HORINO Y MOKUNO Y CHAYAHARA A KIUCHI M FUJII K TAKAI M LOHNER T RYSSEL H SCHORK R
Citation
A. Kinomura et al., OBSERVATION OF LOCAL SIMOX LAYERS BY MICROPROBE RBS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 85(1-4), 1994, pp. 921-924
Citations number
9
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
85
Issue
1-4
Year of publication
1994
Pages
921 - 924
Database
ISI
SICI code
0168-583X(1994)85:1-4<921:OOLSLB>2.0.ZU;2-N
Abstract
Buried oxide layers locally formed by oxygen implantation in silicon w ere analyzed by Rutherford backscattering with a 1.5 MeV He+ microprob e. Lateral and cross-sectional images of O and Si atoms in the buried oxide layers could be successfully obtained by scanning the microprobe over the sample. The Si images showed better contrasts than the O ima ges. A process-failure region was detected by RBS mapping images.