We report results from cathodoluminescence spectroscopy of boron nitri
de films grown on Si(100) substrates by ion-source-assisted magnetron
sputtering of a hexagonal BN target. Three main peaks are observed in
the near-band-gap region for hexagonal boron nitride films at energies
of 4.90, 5.31, and 5.50 eV. We also report deep-level emission spectr
a of predominantly cubic boron nitride films which are correlated with
sample growth conditions. In particular we show that the emission int
ensity, position, and linewidth are strongly dependent on the substrat
e bias voltage used during sample growth.