SURFACE-ROUGHNESS REDUCTION IN ATOMIC LAYER EPITAXY GROWTH OF TITANIUM-DIOXIDE THIN-FILMS

Authors
RITALA M LESKELA M NIINISTO L PROHASKA T FRIEDBACHER G GRASSERBAUER M
Citation
M. Ritala et al., SURFACE-ROUGHNESS REDUCTION IN ATOMIC LAYER EPITAXY GROWTH OF TITANIUM-DIOXIDE THIN-FILMS, Thin solid films, 249(2), 1994, pp. 155-162
Citations number
23
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
249
Issue
2
Year of publication
1994
Pages
155 - 162
Database
ISI
SICI code
0040-6090(1994)249:2<155:SRIALE>2.0.ZU;2-R
Abstract
The surface smoothness of TiO2 films grown by atomic layer epitaxy was improved by incorporating thin intermediate Al2O3 layers into them. T he elimination of light scattering from the film surface caused a mark ed increase in the specular transmittance. Optical measurements, atomi c force microscopy, scanning electron microscopy and X-ray diffraction were used in examining the relationships between the amount of Al2O3 added and the optical, morphological and structural properties of the films. The mechanism of the surface roughness reduction is discussed.