CHARACTERIZATION OF WNX METALLIZATION PREPARED BY ION-IMPLANTATION OFNITROGEN

Authors
GREGUSOVA D LALINSKY T MOZOLOVA Z MACHAJDIK D POCHABA I VAVRA I PORGES M
Citation
D. Gregusova et al., CHARACTERIZATION OF WNX METALLIZATION PREPARED BY ION-IMPLANTATION OFNITROGEN, Thin solid films, 249(2), 1994, pp. 250-253
Citations number
7
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
249
Issue
2
Year of publication
1994
Pages
250 - 253
Database
ISI
SICI code
0040-6090(1994)249:2<250:COWMPB>2.0.ZU;2-B
Abstract
The thermal stability of the sheet resistance of WNx metallization fil m prepared by ion implantation of nitrogen into sputtered tungsten fil m was investigated in correlation with microstructural changes examine d by X-ray and transmission electron microscopy. The effect of microst ructural properties on the sheet resistivity of the metallization film was demonstrated.