CHARACTERISTICS OF CONDUCTION MINIBANDS OF SI SI1-XGEX SUPERLATTICES/

Authors
Citation
Sm. Cho et Hh. Lee, CHARACTERISTICS OF CONDUCTION MINIBANDS OF SI SI1-XGEX SUPERLATTICES/, Journal of applied physics, 75(6), 1994, pp. 3199-3201
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
6
Year of publication
1994
Pages
3199 - 3201
Database
ISI
SICI code
0021-8979(1994)75:6<3199:COCMOS>2.0.ZU;2-W
Abstract
Examined here are the characteristics of conduction bands of Si/Si1-xG ex, superlattices as affected by the type of well and barrier making u p the superlattices and their individual layer thicknesses. Common to all five basic structures studied is the presence of islands in the mi ddle of minibands that are forbidden energy gaps. Optical transitions across the islands can be utilized for photodetection in the very far infrared range. Merging of minibands of two adjacent states into a sin gle one is a distinct feature of double well-and-barrier superlattices .