PROCESS OPTIMIZATION IN THE SEMISOLID FORMING OF HYPEREUTECTIC AL SI MMCS/

Authors
WARD PJ ATKINSON HV KIRKWOOD DH SELLARS CM
Citation
Pj. Ward et al., PROCESS OPTIMIZATION IN THE SEMISOLID FORMING OF HYPEREUTECTIC AL SI MMCS/, Journal de physique. IV, 3(C7), 1993, pp. 1711-1716
Citations number
10
Categorie Soggetti
Physics
Journal title
Journal de physique. IV → ACNP
ISSN journal
11554339
Volume
3
Issue
C7
Year of publication
1993
Part
3
Pages
1711 - 1716
Database
ISI
SICI code
1155-4339(1993)3:C7<1711:POITSF>2.0.ZU;2-1
Abstract
A novel processing route for the fabrication of Al/high silicon MMCs i s presented. The silicon size is much finer than can be achieved by ca sting, yet the materials can stilt be formed into a near-net shape. In itial properties of the MMCs are presented, and methods under investig ation to optimise processing and improve properties are discussed.