The scattering of phonons by neutral n-type impurities in silicon is s
tudied. Following Keyes, who determined the phonon relaxation time for
scattering by neutral impurities in n-type germanium, the relaxation
time for the silicon band structure is developed. This scattering come
s about due to the large effect of strain on the hydrogen-like donor g
round-state energy level. The change in energy of the ground state due
to the strain caused by phonons is calculated and the resulting phono
n scattering relaxation rate is derived.