Fi. Marin et al., ELECTROCHEMICAL-BEHAVIOR OF N-TYPE CDTE IN THE PRESENCE OF A MONOELECTRONIC OXIDIZING-AGENT (CE4+), Journal of the Electrochemical Society, 141(9), 1994, pp. 2409-2413
In this work, the hole-injection effect on n-CdTe from Ce4+ ions reduc
tion and the ulterior oxidation of the material are presented. The oxi
dizing-species concentration varies from 10(-4)M to 5 x 10(-2)M. Withi
n this concentration range, the Levich law is observed for the cathodi
c current. This indicates that the injection current is limited only b
y Ce4+ diffusion from the solution. The presence or absence of a Te0 l
ayer on the electrode surface does not modify the process, whether it
comes from the Br2-MeOH etching or from the oxidation process. The etc
hing of the material is linear with respect to the immersion time, and
the oxidation process occurs in two steps: the formation of a Te(o) f
ilm followed by its oxidation.