The fluctuations of a train of steps on a vicinal surface at equilibri
um and during evaporation are studied in the framework of Burton, Cabr
era and Frank's theory. Step fluctuations are treated as perturbations
of the straight step's shape and within a linear analysis the step mo
rphological stability is investigated in a general way. Previous resul
ts of Bales and Zangwill and of Uwaha and Saito are obtained as specia
l cases when asymmetry between kinetic coefficients for adatom attachm
ent at step edges (the 'Schwoebel effect') is included. A strong Schwo
ebel effect is known to lead to step bunching and to smoothing of an i
solated step during evaporation. Here we show that a strong Schwoebel
effect leads instead to roughening of steps in a train at evaporation
temperatures. Furthermore, we show that the Schwoebel effect is neglig
ible on vicinal surfaces with widely spaced steps at evaporation tempe
ratures. For both reasons, we conclude, in contrast with Uwaha and Sai
to, that the observed phenomenon of kinetic step smoothing during sili
con evaporation cannot be justified by the presence of a strong Schwoe
bel effect. The experimental situation is discussed and a scenario is
proposed that does not invoke a strong Schwoebel effect.