EFFECT OF SIDE WALL ROUGHNESS IN BURIED-CHANNEL WAVE-GUIDES

Authors
LADOUCEUR F LOVE JD SENDEN TJ
Citation
F. Ladouceur et al., EFFECT OF SIDE WALL ROUGHNESS IN BURIED-CHANNEL WAVE-GUIDES, IEE proceedings. Optoelectronics, 141(4), 1994, pp. 242-248
Citations number
17
Categorie Soggetti
Engineering, Eletrical & Electronic",Optics,Telecommunications
Journal title
IEE proceedings. Optoelectronics → ACNP
ISSN journal
13502433
Volume
141
Issue
4
Year of publication
1994
Pages
242 - 248
Database
ISI
SICI code
1350-2433(1994)141:4<242:EOSWRI>2.0.ZU;2-M
Abstract
An atomic force microscope is employed to measure the edge roughness o f masks used in the fabrication of rectangular-core buried channed wav eguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the si des of the core can then be estimated using a simple statistical model to process the measured data.