Mr. Sardela et Gv. Hansson, DIRECT MEASUREMENTS OF LATTICE-PARAMETER VARIATIONS AND RELAXATION KINETICS IN STRAINED SI1-XGEX SI HETEROSTRUCTURES/, Applied physics letters, 65(11), 1994, pp. 1442-1444
Lattice parameter variations in strained Si1-xGex/Ge (x<0.23) induced
by high-temperature annealing in the range 700-1000-degrees-C, were de
termined by x-ray high-resolution reciprocal lattice mapping of the cr
ystal structure. In the range 700-800-degrees-C, the strain relaxation
was found to increase by one order of magnitude owing to glide propag
ation of misfit dislocations, with an activation energy of 2.3 eV In t
he range 850-1000-degrees-C, relaxation was still high but the increas
e with the temperature was limited by dislocation interactions.