Jw. Orton et al., RECOMBINATION LIFETIME MEASUREMENTS IN ALGAAS GAAS QUANTUM-WELL STRUCTURES/, Semiconductor science and technology, 9(9), 1994, pp. 1616-1622
We report the results of photoluminescence and minority carrier lifeti
me measurements on a set of lightly doped AlGaAs/GaAs quantum well str
uctures grown by solid source molecular beam epitaxy. Growth temperatu
res were varied between 600 and 700-degrees-C and the arsenic supplied
in dimer or tetramer form. The lifetimes show a marked dependence on
growth temperature when As4 is used, peaking sharply in the region of
675-degrees-C, but are sensibly independent of growth temperature when
using As2. They are nearly an order of magnitude less than the radiat
ive lifetimes expected for the doping levels used, so we interpret our
results in terms of Shockley-Read recombination via deep centres in t
he barrier material. Lifetimes measured on n- and p-type samples are c
losely similar, which can be explained in terms of a modified version
of the standard Shockley-Read process, appropriate to the pseudo two-d
imensional structures of interest here, provided the recombination cen
tre is acceptor-like. We propose that it is related to oxygen incorpor
ated in the Al-containing barrier regions.