MONITORING THE ORGANIC CLEANING PROCESS OF INP CRYSTALS BY CONTACT-ANGLE MEASUREMENT

Authors
DASNEVES S DEPAOLI MA
Citation
S. Dasneves et Ma. Depaoli, MONITORING THE ORGANIC CLEANING PROCESS OF INP CRYSTALS BY CONTACT-ANGLE MEASUREMENT, Semiconductor science and technology, 9(9), 1994, pp. 1719-1721
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
Journal title
Semiconductor science and technology → ACNP
ISSN journal
02681242
Volume
9
Issue
9
Year of publication
1994
Pages
1719 - 1721
Database
ISI
SICI code
0268-1242(1994)9:9<1719:MTOCPO>2.0.ZU;2-M
Abstract
Water drop contact-angle measurements were used to monitor the organic contamination cleaning process of InP crystals by refluxing in a sequ ence of solvents. A single reflux in methanol reduces the contact angl e by the same amount as a solvent sequence. MOCVD confirms the cleanli ness of the InP crystals treated by a single reflux in methanol.