AUGER-ELECTRON SPECTROSCOPY STUDIES OF INTERDIFFUSION IN ELECTRODEPOSITED AMORPHOUS NI-P ALLOYS

Authors
BUKALUK A
Citation
A. Bukaluk, AUGER-ELECTRON SPECTROSCOPY STUDIES OF INTERDIFFUSION IN ELECTRODEPOSITED AMORPHOUS NI-P ALLOYS, Surface and interface analysis, 22(1-12), 1994, pp. 18-21
Citations number
23
Categorie Soggetti
Chemistry Physical
Journal title
Surface and interface analysis → ACNP
ISSN journal
01422421
Volume
22
Issue
1-12
Year of publication
1994
Pages
18 - 21
Database
ISI
SICI code
0142-2421(1994)22:1-12<18:ASSOII>2.0.ZU;2-R
Abstract
The effect of annealing on the Auger electron depth profiles of electr odeposited amorphous Ni100-(y)P(y)/Ni100-(x)P(x) (15 < x < 32 at.%, y > x) thin film couples is studied at temperatures in the range 190-280 -degrees-C. Diffusion coefficients are evaluated by the means of the B oltzmann-Matano method. The composition dependence of diffusion coeffi cients is explained by the role of free volumes in amporphous material s on interdiffusion.