A. Bukaluk, AUGER-ELECTRON SPECTROSCOPY STUDIES OF INTERDIFFUSION IN ELECTRODEPOSITED AMORPHOUS NI-P ALLOYS, Surface and interface analysis, 22(1-12), 1994, pp. 18-21
The effect of annealing on the Auger electron depth profiles of electr
odeposited amorphous Ni100-(y)P(y)/Ni100-(x)P(x) (15 < x < 32 at.%, y
> x) thin film couples is studied at temperatures in the range 190-280
-degrees-C. Diffusion coefficients are evaluated by the means of the B
oltzmann-Matano method. The composition dependence of diffusion coeffi
cients is explained by the role of free volumes in amporphous material
s on interdiffusion.