G. Gergely et al., ELECTRON-SPECTROSCOPY OF POROUS SILICON LAYERS INDIRECT DETECTION OF HYDROGEN BY ELASTIC PEAK ELECTRON-SPECTROSCOPY, Surface and interface analysis, 22(1-12), 1994, pp. 271-274
Efficient visible luminescence from porous Si (PSi) layers is associat
ed with the quantum size and the presence of hydrogen as a passivaant
on the inner surface. The increase of the amount of H was performed by
wet chemical etching in HF, producing the increase of photoluminescen
ce intensity. The detection of H is not possible by AES or XPS and is
difficult even with EELS. Elastic peak electron spectroscopy (EPES) sh
owed a large decrease of the elastic reflection coefficient r(e) appea
ring in the elastic peak, and measured with a retarding field analyser
(RFA). The effective elastic backscattering coefficients of a monolay
er of H, Si, O were calculated for the RFA angular window and resulted
in reasonable agreement with literature data available. They were com
pleted for the 50-100 eV range. Experiments on a Si(111) wafer verifie
d calculations. A dramatic decrease of r(e) was found on HF-etched PSI
(a factor of 3-10) in the 50-100 eV range. Above 200 eV, effects are
shadowed by the contribution of deeper layers of the substrate and red
uced attenuation of the H adlayer. This indicates the formation of hig
h H coverage on the porous inner surface. Experiments are interpreted
by multiple elastic reflection and attenuation of electrons by the H-c
overed porous surface. Detailed AES and EELS studies made with a hemis
pherical analyser resulted in Si and SiO2 bond on the surface.