ELECTRON-SPECTROSCOPY OF POROUS SILICON LAYERS INDIRECT DETECTION OF HYDROGEN BY ELASTIC PEAK ELECTRON-SPECTROSCOPY

Citation
G. Gergely et al., ELECTRON-SPECTROSCOPY OF POROUS SILICON LAYERS INDIRECT DETECTION OF HYDROGEN BY ELASTIC PEAK ELECTRON-SPECTROSCOPY, Surface and interface analysis, 22(1-12), 1994, pp. 271-274
Citations number
23
Categorie Soggetti
Chemistry Physical
ISSN journal
01422421
Volume
22
Issue
1-12
Year of publication
1994
Pages
271 - 274
Database
ISI
SICI code
0142-2421(1994)22:1-12<271:EOPSLI>2.0.ZU;2-C
Abstract
Efficient visible luminescence from porous Si (PSi) layers is associat ed with the quantum size and the presence of hydrogen as a passivaant on the inner surface. The increase of the amount of H was performed by wet chemical etching in HF, producing the increase of photoluminescen ce intensity. The detection of H is not possible by AES or XPS and is difficult even with EELS. Elastic peak electron spectroscopy (EPES) sh owed a large decrease of the elastic reflection coefficient r(e) appea ring in the elastic peak, and measured with a retarding field analyser (RFA). The effective elastic backscattering coefficients of a monolay er of H, Si, O were calculated for the RFA angular window and resulted in reasonable agreement with literature data available. They were com pleted for the 50-100 eV range. Experiments on a Si(111) wafer verifie d calculations. A dramatic decrease of r(e) was found on HF-etched PSI (a factor of 3-10) in the 50-100 eV range. Above 200 eV, effects are shadowed by the contribution of deeper layers of the substrate and red uced attenuation of the H adlayer. This indicates the formation of hig h H coverage on the porous inner surface. Experiments are interpreted by multiple elastic reflection and attenuation of electrons by the H-c overed porous surface. Detailed AES and EELS studies made with a hemis pherical analyser resulted in Si and SiO2 bond on the surface.