Am. Kaminska et al., ELLIPSOMETRIC INVESTIGATION OF SINGLE-CRYSTALLINE CZ-SI SUBJECTED TO HYDROSTATIC-PRESSURE, Surface and interface analysis, 22(1-12), 1994, pp. 346-349
The application of ellipsometry to study the SiO(x)/Si system subjecte
d to hydrostatic pressures up to 1.8 GPa at temperatures up to 1280-de
grees-C is described. The theoretical model of defects as the spherica
l disturbances of material has been assumed. The ellipsometric paramet
ers have been analysed as a function of defects size and density and c
ompared with data obtained by etching and x-ray methods. The applicabi
lity of ellipsometry for near-surface defect structure analysis has be
en discussed.