The electronic properties of amorphous and ion-implanted polycrystalli
ne SnO2 films have been studied using x-ray photoemission spectromicro
scopy. First, we analysed the degree of oxidation and the homogeneity
of as-deposited films. The SnO and SnO2 phases were identified from th
eir valence band spectra rather than from the Sn 3d core level spectra
. Then we studied the damage effects due to the implantation of Pd+ an
d Ga+ ions in polycrystalline films. The ion bombardment of SnO2 films
results in drastic changes of valence-band spectra which is correlate
d to compositional changes. Annealing in air at 600-degrees-C for 4 le
ads to complete recovery of radiation damage. However, after such ther
mal annealings, the film surface still contains a relatively high amou
nt of SnO (5-10%).