THE USE OF XPS VALENCE-BAND SPECTRA IN THE STUDY OF PLASMA-DEPOSITED POLYMERIC FILMS OF TETRAMETHYLDISILOXANE OR HYDROXYETHYLMETHACRYLATE

Authors
GARBASSI F MORRA M OCCHIELLO E POZZI L
Citation
F. Garbassi et al., THE USE OF XPS VALENCE-BAND SPECTRA IN THE STUDY OF PLASMA-DEPOSITED POLYMERIC FILMS OF TETRAMETHYLDISILOXANE OR HYDROXYETHYLMETHACRYLATE, Surface and interface analysis, 22(1-12), 1994, pp. 485-490
Citations number
20
Categorie Soggetti
Chemistry Physical
Journal title
Surface and interface analysis → ACNP
ISSN journal
01422421
Volume
22
Issue
1-12
Year of publication
1994
Pages
485 - 490
Database
ISI
SICI code
0142-2421(1994)22:1-12<485:TUOXVS>2.0.ZU;2-R
Abstract
Thin polymeric films were deposited from tetramethyldisiloxane (TMDSO) and hydroxyethylmethacrylate (HEMA) plasma. X-ray photoelectron spect roscopy (XPS) and XPS valence band (XPS-VB) analyses were performed to detect the effect of the deposition conditions on the structure of th e plasma-deposited films. In both cases XPS-VB spectra were found stro ngly affected by the deposition conditions. Furthermore, XPS-VB analys is can be used to obtain information on the structure and performances of these classes of plasma-deposited polymer films.