FRESNEL DIFFRACTION THEORY FOR SURFACE PHOTO-DISPLACEMENT IN SEMICONDUCTORS

Authors
FANG JW LI BC ZHANG SY KUO PK
Citation
Jw. Fang et al., FRESNEL DIFFRACTION THEORY FOR SURFACE PHOTO-DISPLACEMENT IN SEMICONDUCTORS, Progress in Natural Science, 6, 1996, pp. 475-478
Citations number
7
Categorie Soggetti
Multidisciplinary Sciences
Journal title
Progress in Natural Science → ACNP
ISSN journal
10020071
Volume
6
Year of publication
1996
Supplement
S
Pages
475 - 478
Database
ISI
SICI code
1002-0071(1996)6:<475:FDTFSP>2.0.ZU;2-X
Abstract
A three-dimensional theoretical model for a new measurement of surface photo-displacement in semiconductor materials is presented. In the th eoretical model, two additional photothermal effects, i.e., the air-th ermal lens effect above the sample surface and the photoreflectance ef fect of the sample, are taken into account. It is shown that these add itional effects can appreciably influence the diffraction pattern and the detected photothermal signal.