SOME MECHANISMS OF THE ACTION OF ADDITIVES IN ELECTRODEPOSITION PROCESSES

Authors
Citation
Tc. Franklin, SOME MECHANISMS OF THE ACTION OF ADDITIVES IN ELECTRODEPOSITION PROCESSES, Plating and surface finishing, 81(4), 1994, pp. 62-67
Citations number
64
Categorie Soggetti
Metallurgy & Mining","Materials Science, Coatings & Films
ISSN journal
03603164
Volume
81
Issue
4
Year of publication
1994
Pages
62 - 67
Database
ISI
SICI code
0360-3164(1994)81:4<62:SMOTAO>2.0.ZU;2-F
Abstract
This review is of mechanisms by which additives have been postulated t o affect the rate of deposition of metals and their alloys. Emphasis i s on recent work in our laboratories, where mechanisms have been teste d by choosing systems expected to exhibit the appropriate chemical beh avior. Mechanisms chosen for study include: (a) ion bridging, (b) ion pairing, (c) changes in interfacial tension, (d) hydrogen evolution ef fects, (e) hydrogen adsorption, and (f) electrode filming. The possibl e role of electrode filming in electrodeposition of difficult-to-plate metals is discussed, as well as anomalous and induced codeposition of alloys, and deposition of stoichiometric alloys, such as the nickel-t in system.