Hw. Vanderhart, PARTIAL AND TOTAL MULTIPHOTON DETACHMENT RATES FOR H- IN A PERTURBATIVE B-SPLINE-BASED APPROACH, Physical review. A, 50(3), 1994, pp. 2508-2516
An ab initio approach has been applied to study multiphoton detachment
rates for the negative hydrogen ion in the lowest nonvanishing order
of perturbation theory. The approach is based on the use of B splines
allowing an accurate treatment of the electronic repulsion. Total deta
chment rates have been determined for two- to six-photon processes as
well as partial rates for detachment into the different final symmetri
es. It is shown that B-spline expansions can yield accurate continuum
and bound-state wave functions in a very simple manner. The calculated
total rates for two- and three-photon detachment are in good agreemen
t with other perturbative calculations. For more than three-photon det
achment little information has been available before now. While the to
tal cross sections show little structure, a fair amount of structure i
s predicted in the partial cross sections. In the two-photon process,
it is shown that the detached electrons mainly have s character. For f
our-and six-photon processes, the contribution from the d channel is t
he most important. For three-and five-photon processes p electrons dom
inate the electron emission spectrum. Detachment rates for s and p ele
ctrons show minima as a function of photon energy.