F. Forti et Me. Wright, MEASUREMENT OF MOS CURRENT MISMATCH IN THE WEAK INVERSION REGION, IEEE journal of solid-state circuits, 29(2), 1994, pp. 138-142
We have measured the current matching properties of MOS transistors op
erated in the weak inversion region. We measured a total of about 1400
PMOS and NMOS transistors produced in four different processes and re
port here the results in terms of mismatch dependence on current densi
ty, device dimensions, and substrate voltage, without using any specif
ic model for the transistor.