G. Malamud et al., THE PHOTOYIELD OF CSI, AMORPHOUS-SILICON AND ORGANOMETALLIC REFLECTIVE PHOTOCATHODE MATERIALS, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 343(1), 1994, pp. 121-128
We investigated the photoyield from CsI, p and n doped and undoped amo
rphous silicon and some organometallic (decamethyl-ferrocene,1,1',dime
thylferrocene and ruthenocene) reflective photocathodes, in the spectr
al range 140-220 nm. The measurements were made in a current collectio
n mode, in vacuum and in methane. Powder and crystal forms of CsI were
used for evaporation of bulk and porous photocathodes. The radiation
resistance of CsI was measured at doses reaching 4500 Gy. The effect o
n the quantum efficiency of various n and p doping levels of amorphous
silicon was measured.