EFFECT OF ANNEALING ON PHOTOREFRACTIVE DAMAGE IN TITANIUM-INDIFFUSED LINBO(3) MODULATORS

Authors
BETTS GE ODONNELL FJ RAY KG
Citation
Ge. Betts et al., EFFECT OF ANNEALING ON PHOTOREFRACTIVE DAMAGE IN TITANIUM-INDIFFUSED LINBO(3) MODULATORS, IEEE photonics technology letters, 6(2), 1994, pp. 211-213
Citations number
10
Categorie Soggetti
Optics,"Physics, Applied
Journal title
IEEE photonics technology letters → ACNP
ISSN journal
10411135
Volume
6
Issue
2
Year of publication
1994
Pages
211 - 213
Database
ISI
SICI code
1041-1135(1994)6:2<211:EOAOPD>2.0.ZU;2-#
Abstract
We have evaluated photorefractive effects at 1320-nm and 1064-nm optic al wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive dam age is substantially increased by anneals in non-oxygen atmospheres at temperatures greater-than-or-equal-to 200-degrees-C. The sensitivity can be reduced by an anneal in oxygen. Properly annealed modulators op erated for 150 h with 400 mW at 1320 nm with no photorefractive effect s other than a 3-degrees change in bias point.