INFLUENCE OF EXPERIMENTAL PARAMETERS ON REACTIVE MAGNETRON SPUTTERINGCNX THIN-FILMS

Authors
ZHENG WT DING T IVANOV I SUNDGREN JE
Citation
Wt. Zheng et al., INFLUENCE OF EXPERIMENTAL PARAMETERS ON REACTIVE MAGNETRON SPUTTERINGCNX THIN-FILMS, JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 13(2), 1997, pp. 154-156
Citations number
12
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY → ACNP
ISSN journal
10050302
Volume
13
Issue
2
Year of publication
1997
Pages
154 - 156
Database
ISI
SICI code
1005-0302(1997)13:2<154:IOEPOR>2.0.ZU;2-7
Abstract
Carbon nitride thin films were deposited on Si(001) using unbalanced m agnetron sputtering at different experimental parameters. The effects of nitrogen partial pressure, substrate temperature and substrate bias on the deposition rate and nitrogen content are discussed.