A. Moliton et al., COMPETITION BETWEEN DAMAGE AND DOPING DUR ING ION-IMPLANTATION OF ELECTROACTIVE POLYMERS, Journal de physique. III, 4(9), 1994, pp. 1689-1706
Citations number
36
Categorie Soggetti
Material Science","Phsycs, Fluid & Plasmas","Physics, Applied
From a general band scheme appropriate for electroactive polymers, we
explain how each of the two main processes (damage or doping) induced
by ion implantation can play a major role. DC conductivity, thermopowe
r and AC conductivity studied versus temperature for varying implantat
ion parameters allow us to confirm our interpretations: damage is prod
uced by high implantation parameters in which case transport phenomena
of p type occur mainly in degenerate states near the Fermi level, whe
reas low implantation parameters induce doping in polaronic bands char
acterized by thermally activated processes, although effects due to th
e existence of defects can appear, especially at low temperature. Comp
ensation effects, described by a Kubo-Greenwood formula applied to the
thermoelectric power, give a consistent explanation of the successive
behaviours. Moreover, we present a general interpretation of the p ty
pe conductivity behaviour observed in intrinsic polymers.