RELATIVE SECONDARY-ELECTRON YIELDS FROM CLEAN METALS UNDER FAST-ATOM-BOMBARDMENT AND ANGLE-INTEGRATED UV-PHOTOELECTRON SPECTRA IN A PHOTOELECTRON SPECTROMICROSCOPE

This article describes the construction and operation of a source of 2 -5 keV argon atoms for use in the strong (1-7 T) B-field environment o f a photoelectron spectromicroscope. The velocity spread of the atom b eam has been determined from the time of flight. Atom-induced secondar y-electron yield measurements on selected areas of various metallic el emental samples are described and the results shaw that yields differ by up to a factor of 4X10(3) between elements and trend towards lower yields with increasing atomic number. A number of ultraviolet photoele ctron spectra of the fast-atom sputter-cleaned sample surfaces are als o presented. These spectra are angle-integrated over the full 2 pi of electron-emission angles.