Wj. Meng et al., GROWTH OF ALUMINUM NITRIDE THIN-FILMS ON SI(111) AND SI(001) - STRUCTURAL CHARACTERISTICS AND DEVELOPMENT OF INTRINSIC STRESSES, Journal of applied physics, 75(7), 1994, pp. 3446-3455
We have grown aluminum nitride thin films by ultrahigh vacuum reactive
sputter deposition on Si(111) and Si(001) substrates. We show results
of film characterization by Raman scattering, ion beam channeling, an
d transmission electron microscopy, which establish the occurrence of
epitaxial growth of wurtzitic aluminum nitride thin films on Si(111) a
t temperatures above 600-degrees-C. In contrast, microstructural chara
cterization by transmission electron microscopy shows the formation of
highly oriented polycrystalline wurtzitic aluminum nitride thin films
on Si(001). Real-time substrate curvature measurements reveal the exi
stence of large intrinsic stresses in aluminum nitride thin films grow
n on both Si(111) and Si(001) substrates.