STUDY OF BORON-NITRIDE DEPOSITION PROCESS FROM DIBORANE AND AMMONIA GAS-MIXTURES

Boron nitride, in powder and thin film forms, has been obtained by che mical vapour deposition (CVD) from diborane and ammonia gas mixtures i n a hot-wall reactor. Pressure, temperature and flow-ratio effects on the deposition reaction and films characteristics have been studied by infrared (ir) spectroscopy. In the ir spectra, besides the B-N band a t 1380 cm(-1), the peak at 2520 cm(-1) corresponding to the B-H stretc hing vibration and N-H band at 3300 cm(-1) have been detected. In the 600-850 degrees C temperature range, the position of the main peak (B- N) does not change, but the deposition rate is noticeably affected by the deposition temperature.