VACUUM TECHNOLOGY ON FUSION DEVICES

Authors
VARANDAS CAF
Citation
Caf. Varandas, VACUUM TECHNOLOGY ON FUSION DEVICES, Vacuum, 45(10-11), 1994, pp. 1063-1066
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
45
Issue
10-11
Year of publication
1994
Pages
1063 - 1066
Database
ISI
SICI code
0042-207X(1994)45:10-11<1063:VTOFD>2.0.ZU;2-T
Abstract
The vacuum technology procedures on fusion devices concerning, namely, the design, manufacture and basic conditioning of the vacuum vessel a re described. A general description of the vacuum systems is also give n. Finally, the plasma-wall interaction and some advanced conditioning processes are reported.