STUDY OF THE INTERDIFFUSION OF CERAMIC THIN-FILMS DEPOSITED ON SI(100) BY LASER-ABLATION

Authors
SANCHEZ F FERRATER C AGUIAR R VARELA M
Citation
F. Sanchez et al., STUDY OF THE INTERDIFFUSION OF CERAMIC THIN-FILMS DEPOSITED ON SI(100) BY LASER-ABLATION, Vacuum, 45(10-11), 1994, pp. 1131-1133
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
45
Issue
10-11
Year of publication
1994
Pages
1131 - 1133
Database
ISI
SICI code
0042-207X(1994)45:10-11<1131:SOTIOC>2.0.ZU;2-P
Abstract
The interface between different ceramic thin films and the Si(1OO) sub strate has been studied by means of secondary ion mass spectrometry an d X-ray photoelectron spectroscopy. The deposited materials have been yttria-stabilized zirconia (YSZ) and strontium titanate. Because these materials are currently used as a buffer layer to deposit superconduc ting YBa2Cu3O7-X (YBCO) films on silicon, it is interesting to know th eir degree of reactivity with silicon, as well as with YBCO. The resul ts indicate a low reactivity between YSZ and silicon, whereas a relati vely important reaction of SrTiO3 with silicon is observed.