Rb. Capaz et al., IDENTIFICATION OF THE MIGRATION PATH OF INTERSTITIAL CARBON IN SILICON, Physical review. B, Condensed matter, 50(11), 1994, pp. 7439-7442
We have performed ab initio total-energy calculations of ground-state
properties and migration paths of interstitial carbon in silicon. The
ground state involves threefold-coordinated carbon and silicon atoms a
nd its geometry suggests primarily p and sp bonding for carbon, rather
than sp(2) one would naively expect. Examination of possible migratio
n paths reveals that only three correspond to small ''jumps'' involvin
g a single ''bond breaking.'' Of these, we predict that only one has a
barrier of considerably lower energy (similar to 0.5 eV) and involves
an intermediate ''saddle-point'' configuration of C-2 symmetry.