We have studied the zero magnetic field resistivity rho of unique high
-mobility two-dimensional electron systems in silicon. At very low ele
ctron density n(s) (but higher than some sample-dependent critical val
ue n(cr) similar to 10(11) cm(-2)), conventional weak localization is
overpowered by a sharp drop of rho by an order of magnitude with decre
asing temperature below similar to 1-2 K. No further evidence for elec
tron localization is seen down to at least 20 mK. For n(s) < n(cr), th
e sample is insulating. The resistance is empirically found to scale w
ith temperature both below and above n(cr) with a single parameter tha
t approaches zero at n(s) = n(cr) suggesting a metal-insulator phase t
ransition.