GROWTH AND CHARACTERIZATION OF EPITAXIAL CUBIC BORON-NITRIDE FILMS ONSILICON - COMMENT

Citation
Kf. Mccarty et al., GROWTH AND CHARACTERIZATION OF EPITAXIAL CUBIC BORON-NITRIDE FILMS ONSILICON - COMMENT, Physical review. B, Condensed matter, 50(12), 1994, pp. 8907-8910
Citations number
21
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
50
Issue
12
Year of publication
1994
Pages
8907 - 8910
Database
ISI
SICI code
0163-1829(1994)50:12<8907:GACOEC>2.0.ZU;2-O
Abstract
We review the x-ray-diffraction and high-resolution transmission elect ron microscopy (HRTEM) data that Doll et al. [Phys. Rev. B 43, 6816 (1 991)] used as evidence for the epitaxial growth of cubic boron nitride (cBN) on silicon (001) surfaces. The three reported x-ray-diffraction peaks do not provide unambiguous evidence for cBN due to potential in terference from the graphitelike phase of BN and from artifacts of the silicon substrate. We provide an interpretation of their HRTEM image. Our interpretation does not provide support for an epitaxial cBN/Si r elationship or the presence of cBN.