MICROSTRUCTURAL DEVELOPMENT IN PHYSICAL VAPOR-DEPOSITED PARTIALLY-STABILIZED ZIRCONIA THERMAL BARRIER COATINGS

Citation
Yh. Sohn et al., MICROSTRUCTURAL DEVELOPMENT IN PHYSICAL VAPOR-DEPOSITED PARTIALLY-STABILIZED ZIRCONIA THERMAL BARRIER COATINGS, Thin solid films, 250(1-2), 1994, pp. 1-7
Citations number
16
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
250
Issue
1-2
Year of publication
1994
Pages
1 - 7
Database
ISI
SICI code
0040-6090(1994)250:1-2<1:MDIPVP>2.0.ZU;2-F
Abstract
The effects of processing parameters of physical vapour deposition on the microstructure of partially stabilized zirconia (PSZ) thermal barr ier coatings have been experimentally investigated. Emphasis has been placed on the crystallographic texture of the PSZ coatings and the mic rostructure of the top surface of the PSZ coatings as well as the meta l-ceramic interface. The variations in the deposition chamber temperat ure, substrate thickness, substrate rotation and vapour incidence angl e resulted in the observation of significant differences in the crysta llographic texture and microstructure of the PSZ coatings.