WORK FUNCTION MEASUREMENTS FOR GAS-DETECTION USING TIN OXIDE LAYERS WITH A THICKNESS BETWEEN 1-NM AND 200-NM

Citation
B. Flietner et I. Eisele, WORK FUNCTION MEASUREMENTS FOR GAS-DETECTION USING TIN OXIDE LAYERS WITH A THICKNESS BETWEEN 1-NM AND 200-NM, Thin solid films, 250(1-2), 1994, pp. 258-262
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
250
Issue
1-2
Year of publication
1994
Pages
258 - 262
Database
ISI
SICI code
0040-6090(1994)250:1-2<258:WFMFGU>2.0.ZU;2-1
Abstract
Tin oxide films, 1, 2, 20, 50, 80 and 200 nm thick, were deposited on platinum and titanium/tungsten surfaces by reactive sputter deposition . The structure and composition of tin oxide as well as the film homog eneity were investigated by scanning electron microscopy, Anger electr on spectroscopy, Rutherford backscattering spectrometry and atomic for ce microscopy. The 200 nm SnO2 films are polycrystalline, with a grain size between 40 and 80 nm. For layers between 20 and 200 nm the compo sition is characteristic for stoichiometric SnO2. The 1 and 2 nm layer s show a homogeneous coverage of the metal. For all sensitive systems gas measurements were carried out with a Kelvin probe. Testing gases w ere humidity (40% r.h.), carbon monoxide (1000 ppm), hydrogen (100 ppm ), nitrogen dioxide (8 ppm) and ammonia (10 ppm). For thinner SnO2 adl ayers only surface-related processes contribute to the response, which is still material specific. It turns out that the thin layers are mor e stable.