Thin films of KCl, CsCl and KBr deposited on Si(111) were investigated
by means of target current spectroscopy (TCS). From the TCS initial p
eak position the surface potential changes during deposition were obta
ined. From the surface potential dependence on the alkali halide film
thickness the critical island size in the initial stage of the film gr
owth was estimated: for CsCl, 10 Angstrom; for KCl, 18 Angstrom; for K
Br, 25 Angstrom. In the target current spectra of the alkali halides a
n intensive structure in the energy region corresponding with the band
gap was discovered. One group of peaks was induced by electron irradia
tion and vanished at high temperatures. This fine structure was consid
ered to be due to an electronic transition related to the defect state
s in the bandgap. From the evolution of the TCS maximum intensities th
e defect concentration changes caused by electron irradiation were est
imated.