ETCHING OF THIN-FILMS OF GERMANIUM-MODIFIED BOROPHOSPHOSILICATE GLASSES

Authors
KOVALEVSKII AA
Citation
Aa. Kovalevskii, ETCHING OF THIN-FILMS OF GERMANIUM-MODIFIED BOROPHOSPHOSILICATE GLASSES, Russian journal of applied chemistry, 66(11), 1993, pp. 1878-1883
Citations number
8
Categorie Soggetti
Chemistry Applied
Journal title
Russian journal of applied chemistry → ACNP
ISSN journal
10704272
Volume
66
Issue
11
Year of publication
1993
Part
1
Pages
1878 - 1883
Database
ISI
SICI code
1070-4272(1993)66:11<1878:EOTOGB>2.0.ZU;2-1
Abstract
The mechanism of liquid chemical and plasmochemical etching of boropho sphosilicate thin films deposited in various vapor-gas mixtures has be en studied. Differences in the etching rates increase from borophospho rosilicate films deposited by simultaneous decomposition of heteroorga nic compounds and hydrides to films deposited by decomposition of hydr ides. For thin films deposited in various vapor-gas mixtures and modif ied with germanium, the etching rates correlate with their structural imperfection.