DEFLECTION AND MAXIMUM LOAD OF MICROFILTRATION MEMBRANE SIEVES MADE WITH SILICON MICROMACHINING

Citation
C. Vanrijn et al., DEFLECTION AND MAXIMUM LOAD OF MICROFILTRATION MEMBRANE SIEVES MADE WITH SILICON MICROMACHINING, Journal of microelectromechanical systems, 6(1), 1997, pp. 48-54
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
10577157
Volume
6
Issue
1
Year of publication
1997
Pages
48 - 54
Database
ISI
SICI code
1057-7157(1997)6:1<48:DAMLOM>2.0.ZU;2-6
Abstract
With the use of silicon micromachining, an inorganic membrane sieve fo r microfiltration has been constructed having a silicon nitride membra ne layer with thickness typically 1 mu m and perforations typically be tween 0.5 mu m and 10 mu m in diameter. As a support a [100]-silicon w afer with openings of 1000 mu m in diameter has been used. The thin si licon nitride layer is deposited on an initially dense support by mean s of a suitable chemical vapor deposition method (LPCVD). Perforations in the membrane layer are obtained with use of standard photo lithogr aphy and reactive ion etching (RIE). The deflection and maximum load o f the membrane sieves are calculated in a first approximation. Experim ents to measure the maximum load of silicon-rich silicon nitride membr anes have confirmed this approximation.