C. Vanrijn et al., DEFLECTION AND MAXIMUM LOAD OF MICROFILTRATION MEMBRANE SIEVES MADE WITH SILICON MICROMACHINING, Journal of microelectromechanical systems, 6(1), 1997, pp. 48-54
With the use of silicon micromachining, an inorganic membrane sieve fo
r microfiltration has been constructed having a silicon nitride membra
ne layer with thickness typically 1 mu m and perforations typically be
tween 0.5 mu m and 10 mu m in diameter. As a support a [100]-silicon w
afer with openings of 1000 mu m in diameter has been used. The thin si
licon nitride layer is deposited on an initially dense support by mean
s of a suitable chemical vapor deposition method (LPCVD). Perforations
in the membrane layer are obtained with use of standard photo lithogr
aphy and reactive ion etching (RIE). The deflection and maximum load o
f the membrane sieves are calculated in a first approximation. Experim
ents to measure the maximum load of silicon-rich silicon nitride membr
anes have confirmed this approximation.