IMPROVEMENT IN OPTICAL TRANSPARENCY OF SIC MEMBRANE BY MODULATING SOURCE GAS RATIO IN CHEMICAL-VAPOR-DEPOSITION

Citation
K. Murooka et al., IMPROVEMENT IN OPTICAL TRANSPARENCY OF SIC MEMBRANE BY MODULATING SOURCE GAS RATIO IN CHEMICAL-VAPOR-DEPOSITION, JPN J A P 2, 33(9B), 1994, pp. 120001335-120001337
Citations number
6
Categorie Soggetti
Physics, Applied
Volume
33
Issue
9B
Year of publication
1994
Pages
120001335 - 120001337
Database
ISI
SICI code
Abstract
A method to improve the optical transparency of a SiC membrane is stud ied by modulating the source gas carbon-to-silicon ratio (C/Si) during chemical vapor deposition. As a result of an investigation conducted under different C/Si conditions, the optical transparency was found to be highest at C/Si=0.9. Optical transparency decreased at lower C/Si probably due to the increase of surface roughness, and at higher C/Si due to the degradation of crystal quality. By alternate deposition und er the condition of C/Si=0.8 and 0.95, the SiC membrane with an optica l transparency of 68% was obtained without applying an antireflection coating.