FIELD EVAPORATION OF METAL ATOMS ONTO INSULATOR CONDUCTING SUBSTRATE USING ATOMIC-FORCE MICROSCOPE

Citation
S. Hosaka et H. Koyanagi, FIELD EVAPORATION OF METAL ATOMS ONTO INSULATOR CONDUCTING SUBSTRATE USING ATOMIC-FORCE MICROSCOPE, JPN J A P 2, 33(9B), 1994, pp. 120001358-120001361
Citations number
17
Categorie Soggetti
Physics, Applied
Volume
33
Issue
9B
Year of publication
1994
Pages
120001358 - 120001361
Database
ISI
SICI code
Abstract
The feasibility of field-evaporating metal atoms onto an insulator/con ducting substrate has been investigated. Theoretical and experimental studies clarify that field evaporation is possible in an atomic force microscope (AFM) metal probe/vacuum/thin insulator/conductor configura tion. Theoretically, field evaporation is easily achieved on thin SiO2 insulators of less than 100 Angstrom, though image potential and elec tric field weaken in the presence of an insulating layer. Experiments confirm that ultrasmall gold dots can be formed on a natural SiO2/Si s ubstrate with a threshold voltage of around 10 V. Small dots of 15 nm diameter can be obtained.