S. Hosaka et H. Koyanagi, FIELD EVAPORATION OF METAL ATOMS ONTO INSULATOR CONDUCTING SUBSTRATE USING ATOMIC-FORCE MICROSCOPE, JPN J A P 2, 33(9B), 1994, pp. 120001358-120001361
The feasibility of field-evaporating metal atoms onto an insulator/con
ducting substrate has been investigated. Theoretical and experimental
studies clarify that field evaporation is possible in an atomic force
microscope (AFM) metal probe/vacuum/thin insulator/conductor configura
tion. Theoretically, field evaporation is easily achieved on thin SiO2
insulators of less than 100 Angstrom, though image potential and elec
tric field weaken in the presence of an insulating layer. Experiments
confirm that ultrasmall gold dots can be formed on a natural SiO2/Si s
ubstrate with a threshold voltage of around 10 V. Small dots of 15 nm
diameter can be obtained.