WRITING ERASABLE METALLIC PATTERNS IN INSULATING ALXGA1-XASDX

Citation
T. Thio et al., WRITING ERASABLE METALLIC PATTERNS IN INSULATING ALXGA1-XASDX, Applied physics letters, 65(14), 1994, pp. 1802-1804
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
65
Issue
14
Year of publication
1994
Pages
1802 - 1804
Database
ISI
SICI code
0003-6951(1994)65:14<1802:WEMPII>2.0.ZU;2-3
Abstract
We have optically written persistent but erasable metallic features in insulating epilayers of AlxGa1-xAs doped with Si and Se, which form D X centers. The photocarriers, which remain in the AlxGa1-xAs layer, mo ve freely in the conduction band but are confined to the exposed regio ns. We demonstrate this confinement by optical excitation in a striped pattern; the resulting modulation of the free carrier density is evin ced by an anisotropy of the sample conductance parallel and perpendicu lar to the stripes. The anisotropy, like the photoconductivity itself, is persistent at low temperatures. Erasure is achieved by thermal ann ealing. We estimate that features can be written with better than 1000 angstrom resolution. (C) 1994 American Institute of Physics.